Thin films and Lithography I. Kubicová, D. Pudiš, J. Škriniarová, Ľ. Šušlik Fabrication of submicrometer structures using NSOM lithography L. Matay, R. Andok, A. Ritomský, V. Barák, I. Kostič, S. Partel, P. Hudek Alignment marks for the EBDW lithography D. Haško, A. Šatka, J. Kováč, F. Uherek Charakterization of semiconductor structures using Kelvin probe force microscopy M. Hartmanová, M. Jergel, J.P. Holgado, J.P. Espinos, M. Trgala Effect of deposition temperature and vapour flux incidence angle on the microstructure of Y2O3 films J. Bruncko, M. Netrvalová, P. Šutta, A. Vincze, D. Haško, F. Uherek Annealing and recrystallization of ZnO thin films S. Jurečka, A. Ohnaka, H. Kobayashi Study of structural and optical properties of textured semiconductor surfaces